Photoresist composition

United States of America Patent

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Apr 23, 2013
Grant Date
Apr 21, 2011
app pub date
Oct 12, 2010
filing date
Oct 15, 2009

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Abstract

A Photoresist composition comprising a polymer comprising a structural unit derived from a compound represented by the formula (I):

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Patent Owner	Address
SUMITOMO CHEMICAL COMPANY LIMITED	TOKYO 103-6020

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G03F:PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNE....

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Inventor Name	Address	# of filed Patents	Total Citations
Hashimoto, Kazuhiko	Toyonaka, JP	91	1995
Masuyama, Tatsuro	Toyonaka, JP	69	357
Shigematsu, Junji	Ibaraki, JP	10	37

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Photoresist composition

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United States of America Patent

12903146

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PATENT NO	8426106
APP PUB NO	20110091807A1
SERIAL NO	12903146
DOCKET NO

US Family Size	Non-US Coverage
Patent Longevity	Forward Citations

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
April 23, 2013	US,8426106,B2 US8426106B2	GRANTED PATENT AS SECOND PUBLICATION
April 21, 2011	US,20110091807,A1 US20110091807A1	FIRST PUBLISHED PATENT APPLICATION

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12903146

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