Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same
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United States of America Patent
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Apr 23, 2013
Grant Date -
Jan 19, 2012
app pub date -
Sep 8, 2011
filing date -
Jul 7, 2004
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Abstract
A positive type resist composition for use in liquid immersion exposure comprises: (A) a resin having a monocyclic or polycyclic cycloaliphatic hydrocarbon structure, the resin increasing its solubility in an alkali developer by an action of acid; (B) a compound generating acid upon irradiation with one of an actinic ray and a radiation; (C) an alkali soluble compound having an alkyl group of 5 or more carbon atoms; and (D) a solvent.
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