L-shaped feature, method of making an L-shaped feature and method of making an L-shaped structure
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Apr 23, 2013
Grant Date -
Aug 2, 2012
app pub date -
Jan 28, 2011
filing date -
Jan 28, 2011
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
In accordance with an embodiment of the present invention, a method for making a semiconductor device comprises forming a photo sensitive layer on a semiconductive substrate, and forming an L-shaped structure in the photo sensitive layer by exposing the photo sensitive layer to light via a reticle, wherein the reticle comprises an L-shapes feature having a first non-orthogonal edge at an intersection of two legs of the L-shaped feature.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully