Compound semiconductor device and method of manufacturing the same

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United States of America Patent

PATENT NO 8426892
APP PUB NO 20080197359A1
SERIAL NO

12034273

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Abstract

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A compound semiconductor device has a buffer layer formed on a conductive SiC substrate, an AlxGa1-xN layer formed on the buffer layer in which an impurity for reducing carrier concentration from an unintentionally doped donor impurity is added and in which the Al composition x is 0

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Patent Owner(s)

Patent OwnerAddress
FUJITSU LIMITEDKAWASAKI

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Imanishi, Kenji Kawasaki, JP 81 1651
Kikkawa, Toshihide Kawasaki, JP 100 2353

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