Systems and methods for measuring geometric changes of embedded passive materials during a lamination process
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Apr 23, 2013
Grant Date -
Jul 7, 2011
app pub date -
Jan 7, 2010
filing date -
Jan 7, 2010
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
Systems (200) and methods (300) for measuring geometric changes of a passive material (414) when heat and pressure are applied thereto. The methods involve forming a pad (108, 510) on a passive material panel (410). The pad includes at least one of a layer of a passive material (414) and a layer of a metal (416). The methods also involve coupling an interferometer (810) to the pad. The method also involves forming a multi-layer structure by placing at least one substrate panel (400) on top of the passive material such that an aperture (602) formed in the substrate panel is aligned with the pad. Pressure and heat are applied to the multi-layer structure. Data is collected using the interferometer while the pressure and heat are applied to the multi-layer structure. The interferometer can include, but is not limited to, a Fabry-Perot interferometer, a Michelson interferometer and/or a Mach-Zehnder interferometer.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully