Management apparatus, exposure method, and method of manufacturing device
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United States of America Patent
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Apr 23, 2013
Grant Date -
Mar 17, 2011
app pub date -
Sep 13, 2010
filing date -
Sep 14, 2009
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A management apparatus obtains a list of a plurality of lots for which exposure processes are reserved, an initial value of an aberration of a projection optical system before start of the exposure processes of the plurality of lots, and an allowable value of the aberration of the projection optical system for each of the plurality of lots, generates candidates for an order of the plurality of lots based on the obtained list, calculates a time from start of an exposure process of the first lot until end of an exposure process of the last lot while adjusting time intervals between the lots so that the aberration of the projection optical system in the exposure process of each of the plurality of lots falls below the allowable value, and determines a processing order of the plurality of lots based on the calculated time.
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