Method for manufacturing liquid discharge head
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United States of America Patent
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Apr 30, 2013
Grant Date -
Aug 16, 2012
app pub date -
Apr 26, 2012
filing date -
Dec 21, 2007
priority date (Note) -
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Abstract
A method for manufacturing a liquid discharge head provided with a substrate which has a layer made of silicon nitride and with a discharge port forming member which is disposed above the layer made of silicon nitride and has a discharge port for discharging liquid. The method includes providing a photosensitive layer that is to be the discharge port forming member above the layer made of silicon nitride, and forming the discharge port by exposing the photosensitive layer to i-line. The layer made of silicon nitride has a refractive index of 2.05 or more to light of a wavelength of 633 nm and irradiation with the i-line is performed in the exposure.
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