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• 15 United States
• 10 France
• 8 Japan
• 7 China
• 5 Korea
• 2 Other

Patent Owner(s)

Patent Owner	Address
SUMITOMO CHEMICAL COMPANY LIMITED	TOKYO

International Classification(s)

• C08F:MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONL....
• C07C:ACYCLIC OR CARBOCYCLIC COMPOUNDS
• G03F:PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNE....

• [Classification Symbol]

• [Patents Count]

Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
Hashimoto, Kazuhiko	Toyonaka, JP	91	1995
Ichikawa, Koji	Toyonaka, JP	316	1995

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Maintenance Fees

Fee	Large entity fee	small entity fee	micro entity fee	due date

Fee	Large entity fee	small entity fee	micro entity fee
Surcharge after expiration - Late payment is unavoidable	$700.00	$350.00	$175.00
Surcharge after expiration - Late payment is unintentional	$1,640.00	$820.00	$410.00

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
April 30, 2013	US,8431325,B2   US8431325B2	GRANTED PATENT AS SECOND PUBLICATION
March 03, 2011	US,20110053086,A1   US20110053086A1	FIRST PUBLISHED PATENT APPLICATION

Full Text

US Patent No: 8431325

Compound, resin, resist composition and method for producing resist pattern

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