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• 15 United States
• 10 France
• 8 Japan
• 7 China
• 5 Korea
• 2 Other

Patent Owner(s)

Patent Owner	Address
SUMITOMO CHEMICAL COMPANY LIMITED	TOKYO

International Classification(s)

• C07D:HETEROCYCLIC COMPOUNDS
• C07C:ACYCLIC OR CARBOCYCLIC COMPOUNDS
• G03F:PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNE....

• [Classification Symbol]

• [Patents Count]

Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
Hiraoka, Takashi	Osaka, JP	52	939
Ichikawa, Koji	Osaka, JP	316	1995
Ochiai, Mitsuyoshi	Osaka, JP	14	84

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Maintenance Fees

Fee	Large entity fee	small entity fee	micro entity fee	due date

Fee	Large entity fee	small entity fee	micro entity fee
Surcharge after expiration - Late payment is unavoidable	$700.00	$350.00	$175.00
Surcharge after expiration - Late payment is unintentional	$1,640.00	$820.00	$410.00

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
April 30, 2013	US,8431326,B2   US8431326B2	GRANTED PATENT AS SECOND PUBLICATION
April 12, 2012	US,20120088190,A1   US20120088190A1	FIRST PUBLISHED PATENT APPLICATION

Full Text

US Patent No: 8431326

Salt and photoresist composition comprising the same

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