Surface-treating agent for pattern formation and pattern-forming method using the surface-treating agent
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United States of America Patent
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Apr 30, 2013
Grant Date -
Mar 29, 2012
app pub date -
Nov 30, 2011
filing date -
Mar 26, 2007
priority date (Note) -
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Abstract
A surface-treating agent for forming a resist pattern, includes: a compound represented by formula (1) as defined in the specification, wherein the surface-treating agent is used in a step between a formation of a first resist pattern on a first resist film and a formation of a second resist film on the first resist pattern to form a second resist pattern, and a pattern-forming method uses the surface-treating agent.
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