Process for producing silicic coating, silicic coating and semiconductor device
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United States of America Patent
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Apr 30, 2013
Grant Date -
Jun 3, 2010
app pub date -
Feb 4, 2010
filing date -
Sep 10, 2007
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Abstract
A silicic coating of 2.4 g/cm3 or higher density, obtained by forming a silicic coating precursor with the use of at least one type of silane compound having a photosensitive functional group and thereafter irradiating the silicic coating precursor with at least one type of light. This silicic coating can be used as a novel barrier film or stopper film for semiconductor device.
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