Pattern measuring apparatus and pattern measuring method
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United States of America Patent
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Apr 30, 2013
Grant Date -
Mar 3, 2011
app pub date -
Sep 9, 2010
filing date -
Mar 10, 2008
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Abstract
A pattern measuring apparatus includes: an electron irradiating unit for radiating an electron beam onto a sample while scanning; an image data acquiring unit for acquiring an image of a pattern on the basis of secondary electrons generated from the sample; a measurement region setting unit for setting paired measurement regions each including a pattern edge in the image; and a controlling unit for calculating a distance between pattern edges in the paired measurement regions by detecting a shape of the pattern edge. The control unit calculates edge characteristic curves by finding moving averages of edge profiles and defines the positions of peak values of the edge characteristic curves as edge positions of the patterns in the measurement regions.
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