Charged particle beam writing apparatus and charged particle beam writing method
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United States of America Patent
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Apr 30, 2013
Grant Date -
Jul 26, 2012
app pub date -
Jan 17, 2012
filing date -
Jan 20, 2011
priority date (Note) -
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status (Latency Note)
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Abstract
A charged particle beam writing apparatus includes a plurality of tracking calculation units to calculate a deflection amount of the charged particle beam in regard to a movable substrate, a switching unit for each of a plurality of virtual small regions of the substrate, to input an end signal indicating completion of charged particle beam emission to a respective small region, and to switch from output of one of the tracking calculation units to output of another of the tracking calculation units, and a deflector, while a substrate is moving, to deflect the charged particle beam to an n-th small region, based on an output from one of the tracking calculation units before switching and to deflect the charged particle beam to an (n+1)th small region based on an output from another of tracking calculation units after switching the plurality of tracking calculation units.
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