Device, method, and system for measuring image profiles produced by an optical lithography system
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United States of America Patent
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Apr 30, 2013
Grant Date -
Jan 28, 2010
app pub date -
Jul 22, 2008
filing date -
Jul 22, 2008
priority date (Note) -
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Abstract
Measuring an aerial image with an aerial image measuring device having a light detector and a light blocking layer for separating polarization components of light incident thereon. The light blocking layer has first and second apertures structured differently from each other, wherein the different structures transmit at least one of the polarization components differently. The detector provides separate samples for light transmitted through the first and second apertures. Separate image profiles for each polarization component of the aerial image are generated using the samples provided by the detector. Image recovery for each of the generated image profiles is performed to generate estimated image profiles for each polarization component of the aerial image that exclude the effects of transmission through the first and second apertures of the aerial image measuring device.
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