Extending the lifetime of a deep UV laser in a wafer inspection tool
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United States of America Patent
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Apr 30, 2013
Grant Date -
Dec 29, 2011
app pub date -
Jun 6, 2011
filing date -
Jun 25, 2010
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Abstract
Disclosed herein is a method and apparatus for automatic correction of beam waist position drift in real time, using wafer inspection data taken during normal tool operation. Also disclosed herein is an improved laser astigmatism corrector for use either internal or external to the laser.
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