Nanofabrication process and nanodevice
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United States of America Patent
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May 7, 2013
Grant Date -
May 26, 2011
app pub date -
Nov 24, 2009
filing date -
Nov 24, 2009
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Abstract
A nanofabrication process for use with a photoresist that is disposed on a substrate includes the steps of exposing the photoresist to a grayscale radiation pattern, developing the photoresist to remove a irradiated portions and form a patterned topography having a plurality of nanoscale critical dimensions, and selectively etching the photoresist and the substrate to transfer a corresponding topography having a plurality of nanoscale critical dimensions into the substrate.
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