Method for manufacturing porous structure and method for forming pattern
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United States of America Patent
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May 7, 2013
Grant Date -
Feb 16, 2012
app pub date -
Oct 21, 2011
filing date -
Jun 7, 1999
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Abstract
A pattern forming material contains a block copolymer or graft copolymer and forms a structure having micro polymer phases, in which, with respect to at least two polymer chains among polymer chains constituting the block copolymer or graft copolymer, the ratio between N/(Nc-No) values of monomer units constituting respective polymer chains is 1.4 or more, where N represents total number of atoms in the monomer unit, Nc represents the number of carbon atoms in the monomer unit, No represents the number of oxygen atoms in the monomer unit.
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