Method and system for binding halide-based contaminants
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United States of America Patent
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May 7, 2013
Grant Date -
Nov 1, 2012
app pub date -
Jul 3, 2012
filing date -
Aug 29, 2002
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Abstract
A method and apparatus are presented for reducing halide-based contamination within deposited titanium-based thin films. Halide adsorbing materials are utilized within the deposition chamber to remove halides, such as chlorine and chlorides, during the deposition process so that contamination of the titanium-based film is minimized. A method for regenerating the halide adsorbing material is also provided.
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