Method of measuring focus of a lithographic projection apparatus
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United States of America Patent
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May 7, 2013
Grant Date -
Jan 3, 2013
app pub date -
Sep 4, 2012
filing date -
Nov 20, 2007
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Abstract
A method of measuring focus of a lithographic projection apparatus includes exposure of a photoresist covered test substrate with a plurality of verification fields. Each of the verification fields includes a plurality of verification markers, and the verification fields are exposed using a predetermined focus offset. After developing, an alignment offset for each of the verification markers is measured and translated into defocus data using a transposed focal curve.
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