Systems and methods for adjusting a lithographic scanner
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United States of America Patent
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May 7, 2013
Grant Date -
May 20, 2010
app pub date -
Sep 30, 2009
filing date -
Nov 20, 2008
priority date (Note) -
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status (Latency Note)
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Abstract
A system and methods are provide for modeling the behavior of a lithographic scanner and, more particularly, a system and methods are provide using thresholds of an image profile to characterize through-pitch printing behavior of a lithographic scanner. The method includes running a lithographic model for a target tool and running a lithographic model on the matching tool for a plurality of different settings using lens numerical aperture, numerical aperture of the illuminator and annular ratio of a pattern which is produced by an illuminator. The method then selects the setting that most closely matches the output of the target tool.
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