Atomic layer deposition encapsulation for acoustic wave devices
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
May 14, 2013
Grant Date -
Apr 19, 2012
app pub date -
Sep 14, 2011
filing date -
Oct 13, 2010
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
Acoustic wave devices and methods of coating a protective film of alumina (Al2O3) on the acoustic wave devices are disclosed herein. The protective film is applied through an atomic layer deposition (ALD) process. The ALD process can deposit very thin layers of alumina on the surface of the acoustic wave devices in a precisely controlled manner. Thus, the uniform film does not significantly distort the operation of the acoustic wave device.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully