Composition for stripping and cleaning and use thereof
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United States of America Patent
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May 14, 2013
Grant Date -
Dec 22, 2011
app pub date -
Aug 25, 2011
filing date -
Jul 1, 2004
priority date (Note) -
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Abstract
A composition comprising one or more water soluble organic solvents comprising a glycol ether; water; a fluoride containing compound provided that if the fluoride containing compound is ammonium fluoride than no additional fluoride containing compound is added to the composition; optionally a quaternary ammonium compound; and optionally a corrosion inhibitor is disclosed herein that is capable of removing residues from an article such as photoresist and/or etching residue. Also disclosed herein is a method for removing residues from an article using the composition disclosed herein.
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