System for isolating an exposure apparatus

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 8441615
APP PUB NO 20100053589A1
SERIAL NO

12548895

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Abstract

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A precision assembly (10) for fabricating a substrate (42) includes a precision fabrication apparatus (12), a pedestal assembly (14) and a suspension system (16). The precision fabrication apparatus (12) fabricates the substrate (42). The pedestal assembly (14) supports at least a portion of the fabrication apparatus (12). The suspension system (16) inhibits the transfer of motion between the mounting base (20) and the pedestal assembly (14). The suspension system (16) can include (i) a first boom (380) that is coupled to the mounting base (20) and the pedestal assembly (14), the first boom (380) being pivotable coupled to at least one of the mounting base (20) and the pedestal assembly (14), and (ii) a first resilient assembly (382) that is coupled between the mounting base (20) and at least one of the first boom (380) and the pedestal assembly (14). The first resilient assembly (382) can function similar to a zero length spring over an operational range of the resilient assembly (382). With this design, the components of the precision fabrication apparatus (12) are better protected by the suspension system (16) during a seismic disturbance. This reduces the likelihood of damage and misalignment of the components of the precision fabrication apparatus (12) during the seismic disturbance.

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Patent Owner(s)

Patent OwnerAddress
NIKON RESEARCH CORPORATION OF AMERICA1399 SHOREWAY ROAD BELMONT CA 94002

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hashemi, Fardad A Moraga, US 6 21
Margeson, Christopher Mountain View, US 4 13
Watson, Douglas C Campbell, US 120 2328

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