Pellicle for lithography
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United States of America Patent
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May 21, 2013
Grant Date -
May 19, 2011
app pub date -
Nov 11, 2010
filing date -
Nov 19, 2009
priority date (Note) -
In Force
status (Latency Note)
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Abstract
A pellicle for lithography is provided that includes a pellicle frame provided with one or more atmospheric pressure adjustment holes having an inner peripheral face with a shape that opens out in going toward the inside of the pellicle frame. There is also provided a process for producing the pellicle for lithography, the process comprising a step of forming the pellicle for lithography and a step of spray-coating a pressure-sensitive adhesive composition from inside the pellicle frame.
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