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• 15 United States
• 10 France
• 8 Japan
• 7 China
• 5 Korea
• 2 Other

Patent Owner(s)

Patent Owner	Address
SAMSUNG ELECTRONICS CO LTD	GYEONGGI DO SOUTH KOREA GYEONGGI-DO

International Classification(s)

• G03F:PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNE....

• [Classification Symbol]

• [Patents Count]

Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
Bulliard, Xavier	Yongin-si, KR	31	350
Choi, Yun-hyuk	Seoul, KR	6	88
Lee, Kwang-hee	Suwon-si, KR	90	640
Lee, Kwang-sup	Daejeon, KR	6	50
Park, Jong-jin	Yongin-si, KR	132	1081

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Maintenance Fees

Fee	Large entity fee	small entity fee	micro entity fee	due date

Fee	Large entity fee	small entity fee	micro entity fee
Surcharge after expiration - Late payment is unavoidable	$700.00	$350.00	$175.00
Surcharge after expiration - Late payment is unintentional	$1,640.00	$820.00	$410.00

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
May 21, 2013	US,8445178,B2   US8445178B2	GRANTED PATENT AS SECOND PUBLICATION
May 13, 2010	US,20100119976,A1   US20100119976A1	FIRST PUBLISHED PATENT APPLICATION

Full Text

US Patent No: 8445178

Composition for radical polymerization and method of forming pattern using the composition

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