Hardmask composition having antireflective properties and method of patterning material on substrate using the same

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May 21, 2013
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Nov 10, 2011
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Jul 14, 2011
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Jun 5, 2007

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Abstract

A hardmask composition includes an organic solvent and one or more aromatic ring-containing polymers represented by Formulae 1, 2 and 3:

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Patent Owner	Address
CHEIL INDUSTRIES INC	GYEONGBUK SOUTH KOREA

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G03F:PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNE....

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Inventor Name	Address	# of filed Patents	Total Citations
Cheon, Hwan Sung	Seoul, KR	16	136
Kim, Jong Seob	Daejeon-si, KR	44	453
Kim, Min Soo	Incheon-si, KR	341	2441
Lee, Jin Kuk	Gunpo-si, KR	35	320
Oh, Chang Il	Seongnam-si, KR	23	310
Uh, Dong Seon	Seoul, KR	45	382
Yoon, Kyong Ho	Daejeon-si, KR	10	200

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Hardmask composition having antireflective properties and method of patterning material on substrate using the same

Number of patents in Portfolio can not be more than 2000

United States of America Patent

13183261

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PATENT NO	8445187
APP PUB NO	20110275019A1
SERIAL NO	13183261
DOCKET NO

US Family Size	Non-US Coverage
Patent Longevity	Forward Citations

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
May 21, 2013	US,8445187,B2 US8445187B2	GRANTED PATENT AS SECOND PUBLICATION
November 10, 2011	US,20110275019,A1 US20110275019A1	FIRST PUBLISHED PATENT APPLICATION

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13183261

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