Process for formation of highly uniform arrays of nano-holes and nano-pillars
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United States of America Patent
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May 21, 2013
Grant Date -
Apr 1, 2010
app pub date -
Sep 14, 2009
filing date -
Sep 17, 2008
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Abstract
A photolithography method of patterning photoresist involves disposing a two-dimensional array of focusing particles of spherical or other shape on the photoresist and illuminating the particles on the photoresist to generate deep, sub-wavelength patterns on the photoresist. When developed, a positive photoresist layer generates a two-dimensional array of micro- or nano-holes on the developed photoresist. When developed, a negative photoresist layer generates a two-dimensional array of micro- or nano-pillars on the developed photoresist.
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