Phase change memory devices including phase change layer formed by selective growth methods and methods of manufacturing the same

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United States of America Patent

PATENT NO 8445318
APP PUB NO 20110212568A1
SERIAL NO

13064410

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Abstract

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A phase change memory device including a phase change layer includes a storage node and a switching device. The switching device is connected to the storage node. The storage node includes a phase change layer selectively grown directly on a lower electrode. In a method of manufacturing a phase change memory device, an insulating interlayer is formed on a semiconductor substrate to cover a switching device. A lower electrode connected to the switching device is formed, and a phase change layer is selectively grown directly on the lower electrode.

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Patent Owner(s)

Patent OwnerAddress
SAMSUNG ELECTRONICS CO LTDSUWON-SI GYEONGGI-DO

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Shin, Woong-chul Suwon-si, KR 19 284

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