Electron beam annealing apparatus and annealing methods using the same

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May 21, 2013
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Jun 17, 2010
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Jun 25, 2009
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Dec 15, 2008

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Abstract

Electron beam annealing apparatuses for annealing a thin layer on a substrate and annealing methods using the apparatuses are provided. The electron beam annealing apparatuses may include an electron beam scanning unit that may scan a pulsed electron beam onto a substrate.

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Patent Owner	Address
SAMSUNG ELECTRONICS CO LTD	129 SAMSUNG-RO YEONGTONG-GU SUWON-SI GYEONGGI-DO 16677 16677

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H01L:SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICE....

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Inventor Name	Address	# of filed Patents	Total Citations
Kim, Jong-min	Suwon-si, KR	154	1401
Lee, Chang-soo	Suwon-si, KR	544	19309
Lee, Jung-hyun	Suwon-si, KR	186	6824
Ma, Dong-joon	Anyang-si, KR	24	789

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Electron beam annealing apparatus and annealing methods using the same

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United States of America Patent

12457916

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PATENT NO	8445366
APP PUB NO	20100147807A1
SERIAL NO	12457916
DOCKET NO

US Family Size	Non-US Coverage
Patent Longevity	Forward Citations

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
May 21, 2013	US,8445366,B2 US8445366B2	GRANTED PATENT AS SECOND PUBLICATION
June 17, 2010	US,20100147807,A1 US20100147807A1	FIRST PUBLISHED PATENT APPLICATION

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12457916

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