Patterning of antistiction films for electromechanical systems devices
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United States of America Patent
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May 21, 2013
Grant Date -
May 16, 2013
app pub date -
Nov 10, 2011
filing date -
Nov 10, 2011
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A laser absorption layer is first selectively formed in a seal pattern region surrounding an array of electromechanical systems elements, followed by depositing an antistiction layer as a blanket layer over the substrate and the laser absorption layer. The antistiction layer is then selectively removed from the seal pattern using a laser. An epoxy sealing material is provided in the seal pattern where the antistiction layer was removed and a backplate is sealed to the substrate using epoxy.
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