Method of making an antireflective silica coating, resulting product, and photovoltaic device comprising same

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United States of America Patent

PATENT NO 8445774
APP PUB NO 20090025776A1
SERIAL NO

11878790

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Abstract

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A low-index silica coating may be made by forming a silica precursor having a radiation curable composition including a radiation curable monomer and/or a photoinitiator, and also including a silica sol comprising a silane and/or a colloidal silica. The silica precursor may be deposited on a substrate (e.g., glass substrate) to form a coating layer. The coating layer may then be cured via exposure to electromagnetic radiation, such as UV radiation. Then, the cured coating layer may be fired using temperature(s) of from about 550 to 700° C., in forming the low-index silica based coating. The low-index silica based coating may be used as an antireflective (AR) film on a front glass substrate of a photovoltaic device (e.g., solar cell) in certain example instances.

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Patent Owner(s)

  • GUARDIAN GLASS, LLC.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Varaprasad, Desaraju V Ann Arbor, US 88 12605

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