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• 15 United States
• 10 France
• 8 Japan
• 7 China
• 5 Korea
• 2 Other

Patent Owner(s)

Patent Owner	Address
ASML NETHERLANDS B V	VELDHOVEN

International Classification(s)

• G03B:APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS O....

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• [Patents Count]

Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
Eummelen, Erik Henricus Egidius Catharina	Eindhoven, NL	39	168
Kramer, Pieter Jacob	Veldhoven, NL	12	75
Kuijper, Anthonie	Best, NL	16	101
Van, Der Net Antonius Johannus	Tilburg, NL	31	354

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Maintenance Fees

Fee	Large entity fee	small entity fee	micro entity fee	due date

Fee	Large entity fee	small entity fee	micro entity fee
Surcharge after expiration - Late payment is unavoidable	$700.00	$350.00	$175.00
Surcharge after expiration - Late payment is unintentional	$1,640.00	$820.00	$410.00

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
May 21, 2013	US,8446561,B2   US8446561B2	GRANTED PATENT AS SECOND PUBLICATION
January 20, 2011	US,20110013159,A1   US20110013159A1	FIRST PUBLISHED PATENT APPLICATION

Full Text

US Patent No: 8446561

Lithographic apparatus and a method of measuring flow rate in a two phase flow

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