Lithographic apparatus and device manufacturing method
Number of patents in Portfolio can not be more than 2000
United States of America Patent
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May 21, 2013
Grant Date -
Dec 10, 2009
app pub date -
Jun 2, 2009
filing date -
Jun 2, 2008
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A detection method for detecting a property of an extended pattern formed by at least one line generally extending in a first direction. The extended pattern is formed on a substrate or on a substrate table and preferably extends over a length of at least 50× the width of the line. The extended pattern is focus sensitive. The detection method includes moving the substrate table in a first direction and measuring along that first direction a property of the extended pattern. The property can be a result of a physical property of the extended pattern in a second direction perpendicular to the first direction. In a next step a calibration of the substrate table position can be derived from the measured position of the extended pattern.
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