Method of loading a substrate on a substrate table and lithographic apparatus and device manufacturing method
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
May 21, 2013
Grant Date -
Mar 5, 2009
app pub date -
Sep 4, 2007
filing date -
Sep 4, 2007
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
The invention relates to a method of loading a first object on a second object in a lithographic apparatus. The method includes: a) loading the first object on the second object, b) waiting a predetermined time interval and c) performing a relaxation action. The first object may be a substrate and the second object a substrate table. The first object may also be a substrate table and the second object a support structure, supporting the substrate table.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully