Method and apparatus for increasing local plasma density in magnetically confined plasma

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United States of America Patent

PATENT NO 8449731
SERIAL NO

13033349

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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Local plasma density, e.g., the plasma density in the vicinity of the substrate, is increased by providing an ion extractor configured to transfer ions and electrons from a first region of magnetically confined plasma (typically a region of higher density plasma) to a second region of plasma (typically a region of lower density plasma). The second region of plasma is preferably also magnetically shaped or confined and resides between the first region of plasma and the substrate. A positively biased conductive member positioned proximate the second region of plasma serves as an ion extractor. A positive bias of about 50-300 V is applied to the ion extractor causing electrons and subsequently ions to be transferred from the first region of plasma to the vicinity of the substrate, thereby forming higher density plasma. Provided methods and apparatus are used for deposition and resputtering.

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Patent Owner(s)

  • NOVELLUS SYSTEMS, INC.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Dulkin, Alexander Sunnyvale, US 11 306
Hayden, Douglas B San Jose, US 6 67
Kinder, Ronald L Oakland, US 4 95
Pradhan, Anshu A San Jose, US 138 3696

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