Exposure apparatus, method for producing device, and method for controlling exposure apparatus
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United States of America Patent
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May 28, 2013
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app pub date -
Jan 25, 2006
filing date -
Jul 28, 2003
priority date (Note) -
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Abstract
An exposure apparatus (EX) exposes a substrate (P) by projecting an image of a pattern on the substrate (P) via a projection optical system (PL) and a liquid (1). The exposure device (EX) has a liquid supply mechanism (10) which supplies the liquid (1) between the projection optical system (PL) and the substrate (P). The liquid feeding mechanism (10) stops the supply of the liquid (1) when abnormality is detected. This suppresses influence to devices and members in the periphery of the substrate caused by leakage of the liquid forming a liquid immersion area, thereby realizing satisfactory exposure processing.
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