Exposure apparatus, exposure method, cleaning apparatus, and device manufacturing method
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United States of America Patent
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May 28, 2013
Grant Date -
Oct 29, 2009
app pub date -
Dec 24, 2008
filing date -
Dec 28, 2007
priority date (Note) -
In Force
status (Latency Note)
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Abstract
An exposure apparatus exposes a substrate with exposure light via a liquid. The exposure apparatus includes: an optical member which has an emission surface from which the exposure light is emitted; a movable object which is able to move in a predetermined surface including a position facing the emission surface; and a predetermined component which is able to move between, the optical member and the movable object and which is able to form a space between which and the optical member a liquid is held.
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