Illumination optical system, exposure apparatus, and device manufacturing method
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United States of America Patent
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May 28, 2013
Grant Date -
Jan 19, 2012
app pub date -
Jun 22, 2011
filing date -
Dec 24, 2008
priority date (Note) -
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Abstract
According to one embodiment, an illumination optical system comprises an optical integrator which forms a secondary light source on an illumination pupil plane in an illumination optical path of the illumination optical system with incidence of exposure light from a light source device thereinto; a first transmission filter arranged in an optical path of the exposure light emitted from a first surface illuminant of the secondary light source and having a transmittance characteristic varying according to angles of incidence of the exposure light; a second transmission filter arranged in an optical path of the exposure light emitted from a second surface illuminant of the secondary light source and having a transmittance characteristic varying according to the angles of incidence of the exposure light; and a rotation mechanism which rotates the first and second transmission filters so as to vary an angle of inclination thereof relative to the optical axis of the illumination optical system.
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