Control systems and methods applying iterative feedback tuning for feed-forward and synchronization control of microlithography stages and the like
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United States of America Patent
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May 28, 2013
Grant Date -
Jul 29, 2010
app pub date -
Jan 27, 2010
filing date -
Jan 27, 2009
priority date (Note) -
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Abstract
Stage assemblies and control methods are disclosed. An exemplary assembly includes a first stage and first and second controllers. The first controller feedback-controls the first stage according to a respective parameter vector. The second controller controls the first stage by feed-forward control, according to a respective parameter vector. The controllers perform iterative feedback tuning IFT, including minimization of a cost-function of the parameter vectors from the first and second controllers. The second controller receives data including first-stage trajectory, and the first controller receives data including first-stage following-error. A suitable application of the assembly is in a microlithography system or other high-precision system.
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