Photosensitive insulating resin composition, cured product of the composition, and method of producing insulating film

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Jun 4, 2013
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Aug 5, 2010
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Jan 28, 2010
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Jan 30, 2009

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Abstract

A photosensitive insulating resin composition includes (A) an alkali-soluble resin that contains (a1) a structural unit derived from a crosslinkable monomer and (a2) a structural unit having a phenolic hydroxyl group, (B) a crosslinking agent, (C) a photosensitive compound, and (D) a solvent.

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Patent Owner	Address
JSR CORPORATION	9-2 HIGASHI-SHINBASHI 1-CHOME MINATO-KU TOKYO 1058640 ?1058640

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Inventor Name	Address	# of filed Patents	Total Citations
Itou, Atsushi	Tokyo, JP	90	858
Sasaki, Hirofumi	Tokyo, JP	90	378

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Photosensitive insulating resin composition, cured product of the composition, and method of producing insulating film

Number of patents in Portfolio can not be more than 2000

United States of America Patent

12696021

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PATENT NO	8455173
APP PUB NO	20100196822A1
SERIAL NO	12696021
DOCKET NO

US Family Size	Non-US Coverage
Patent Longevity	Forward Citations

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
June 04, 2013	US,8455173,B2 US8455173B2	GRANTED PATENT AS SECOND PUBLICATION
August 05, 2010	US,20100196822,A1 US20100196822A1	FIRST PUBLISHED PATENT APPLICATION

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12696021

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