Method for reducing chip warpage

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United States of America Patent

PATENT NO 8455999
SERIAL NO

13240540

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Abstract

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A method of forming an integrated circuit structure including providing a wafer comprising a front surface and a back surface, wherein the wafer comprises a chip; forming an opening extending from the back surface into the chip; filling an organic material in the opening, wherein substantially no portion of the organic material is outside of the opening and on the back surface of the wafer; and baking the organic material to cause a contraction of the organic material.

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Patent Owner(s)

Patent OwnerAddress
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD8 LI-HSIN RD 6 HSINCHU SCIENCE PARK HSINCHU 300-78

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Cheng, Chun-Ren Hsin-Chu, TW 128 1344
Lee, Jiou-Kang Zhu-Bei, TW 38 318
Peng, Jung-Huei Jhubei, TW 101 1280
Tsai, Shang-Ying Jhongli, TW 95 886
Wu, Ting-Hau Yilan, TW 33 210

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