Environmental system including vacuum scavenge for an immersion lithography apparatus
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United States of America Patent
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Jun 4, 2013
Grant Date -
Jul 16, 2009
app pub date -
Mar 20, 2009
filing date -
Apr 10, 2003
priority date (Note) -
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Abstract
A liquid containment system is used for a liquid immersion lithography apparatus in which a substrate is exposed through liquid between an optical member of a projection system and the substrate. The liquid containment system includes a liquid containment member which confines the liquid, the liquid containment member including a removing inlet which removes the liquid from a gap between the liquid confinement member and the substrate. The liquid containment system also includes an actuator by which the liquid containment member is moved.
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