Exposure method, exposure device, and micro device manufacturing method
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Jun 4, 2013
Grant Date -
Nov 12, 2009
app pub date -
Jul 22, 2009
filing date -
Jan 25, 2007
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
An exposure device includes: a light source (LS) which emits a pulse light; and a variable shaped mask (8) which has a plurality of aligned micro movable mirrors and forms an arbitrary pattern by selectively changing the operation state of the movable mirrors. A substrate (P) is exposed to the light emitted from the light source and passes through the variable shaped mask. The exposure device further includes a control device (100) which controls the operation timing to change the operation state of the movable mirrors and the pulse application timing of the pulse light emitted from the light source so that they are synchronized.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully