Methods for forming selectively deposited thin films
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United States of America Patent
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Jun 11, 2013
Grant Date -
Dec 29, 2011
app pub date -
Jun 29, 2010
filing date -
Jun 29, 2010
priority date (Note) -
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Abstract
A method for selectively depositing a thin film structure on a substrate is provided. The method includes providing a process gas to a surface of the substrate and directing concentrated electromagnetic energy from a source of energy to at least a portion of the surface. The process gas is decomposed onto the substrate to form a selectively deposited thin film structure.
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