Providing electron beam proximity effect correction by simulating write operations of polygonal shapes
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United States of America Patent
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Jun 11, 2013
Grant Date -
Jul 26, 2012
app pub date -
Jan 21, 2011
filing date -
Jan 21, 2011
priority date (Note) -
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Abstract
A method for writing a design to a material using an electron beam includes assigning a first dosage to a first polygonal shape. The first polygonal shape occupies a first virtual layer and includes a first set of pixels. The method also includes simulating a first write operation using the first polygonal shape to create the design, discerning an error in the simulated first write operation, and assigning a second dosage to a second polygonal shape to reduce the error. The second polygonal shape occupies a second virtual layer. The method further includes creating a data structure that includes the first and second polygonal shapes and saving the data structure to a non-transitory computer-readable medium.
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