Substrate processing apparatus and gas supply method
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United States of America Patent
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Jun 18, 2013
Grant Date -
Jul 31, 2008
app pub date -
Jan 15, 2008
filing date -
Jan 30, 2007
priority date (Note) -
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Abstract
A substrate processing apparatus that can prevent formation of deposit in openings of a plurality of gas supply holes leading into a processing chamber. Each of the gas supply holes is configured to uniformly supply a processing gas, whose molecules are turned into clusters, into the processing chamber and to prevent liquefaction of processing gas when the processing gas is supplied into the processing chamber.
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