Hollow anode plasma reactor and method
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United States of America Patent
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Jun 18, 2013
Grant Date -
Nov 6, 2008
app pub date -
May 15, 2008
filing date -
May 16, 2001
priority date (Note) -
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Abstract
The plasma processing apparatus includes a plasma chamber, a first electrode, a second electrode, and a plasma containment device. The plasma containment device has a plurality of slots and is electrically coupled to the first electrode. The containment device is configured to confine plasma within an inter-electrode volume while facilitating maximum process gas flow. When plasma is generated by applying electric fields to process gas within the inter-electrode volume, the containment device electrically confines the plasma to the inter-electrode volume without significantly restricting the flow of gas from the inter-electrode volume.
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