High frequency power supply
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United States of America Patent
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Jun 18, 2013
Grant Date -
Jan 29, 2009
app pub date -
Jul 22, 2008
filing date -
Jul 23, 2007
priority date (Note) -
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Abstract
For determining a wave running time between a RF source in a plasma power supply device and a load connected to the plasma power supply device, an RF pulse is transmitted forwards from the RF source to the load. The pulses are reflected by the load and transmitted backwards to the power source. A return time measured on arrival of the pulse(s) at the inverter is used to determine a wave running time.
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