Striping methodology for maskless lithography
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United States of America Patent
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Jun 25, 2013
Grant Date -
Mar 7, 2013
app pub date -
Sep 6, 2011
filing date -
Sep 6, 2011
priority date (Note) -
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Abstract
The present disclosure involves a method of performing a maskless lithography process. The method includes receiving a computer layout file for an integrated circuit (IC) device. The layout file contains a plurality of IC sections. The method includes separating the computer layout file into a plurality of sub-files. The method includes striping the plurality of sub-files concurrently using a plurality of computer processors, thereby generating a plurality of striped sub-files. The method includes transferring the plurality of striped sub-files to a maskless lithography system.
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