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• 15 United States
• 10 France
• 8 Japan
• 7 China
• 5 Korea
• 2 Other

Patent Owner(s)

Patent Owner	Address
ASAHI KASEI E-MATERIALS CORPORATION	1-105 KANDA JINBOCHO CHIYODA-KU TOKYO 101-8101

International Classification(s)

• C08G:MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN B....
• G03F:PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNE....

• [Classification Symbol]

• [Patents Count]

Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
Aoai, Natsumi	Tokyo, JP	1	15
Kobayashi, Takaaki	Tokyo, JP	33	290

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Maintenance Fees

Fee	Large entity fee	small entity fee	micro entity fee	due date
11.5 Year Payment	$7400.00	$3700.00	$1850.00	Jan 2, 2025

Fee	Large entity fee	small entity fee	micro entity fee
Surcharge - 11.5 year - Late payment within 6 months	$160.00	$80.00	$40.00
Surcharge after expiration - Late payment is unavoidable	$700.00	$350.00	$175.00
Surcharge after expiration - Late payment is unintentional	$1,640.00	$820.00	$410.00

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
July 02, 2013	US,8475996,B2   US8475996B2	GRANTED PATENT AS SECOND PUBLICATION
August 19, 2010	US,20100209669,A1   US20100209669A1	FIRST PUBLISHED PATENT APPLICATION

Full Text

US Patent No: 8475996

Photosensitive resin composition

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